Course Description:
This course will cover instrumentation, method development and method validation for analyses of elemental impurities in pharmaceutical materials currently being tested using USP Chapter Heavy Metals <231>. The course will be taught in light of the elements and limits proposed in the draft chapter <232> Elemental Impurities, with an emphasis on ICP and ICP-MS analyses consistent with USP general chapter Plasma Spectrochemistry <730> and the default methodology proposed in draft chapter <233> Elemental Impurities – Procedures.
Who Should Attend:
Analytical chemists, QC managers, QA managers, compliance managers, lab managers, produjction mangers and any individual in the pharmaceutical industry with an interest in the application of ICP and ICP-MS to the analysis of metals in API’s, excipients, and drug products.
Duration:
1 Day
Learning Objectives:
- Understand the scope and context of USP’s proposed new chapters on elemental impurities
- Understand the basic theory of ICP-OES and ICP-MS
- Develop an understanding of the strengths and weaknesses of ICP-OES and ICP-MS
- Develop an understanding of elemental impurity method development and validation
| Classroom Cost: | Regular price $695. Save $200 if you register by March 17. | Instructor:Dr. Anthony DeStefano |
| Date and Location: | April 7, 2010; Rockville, MD (USP Headquarters) |
For more info or to register, click here
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